MO source material
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MO source material
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The source bottle factory mainly researches and produces packaging containers for various types of liquid precursors and solid precursors in the CVD/ALD process. The factory is equipped with cleanrooms of Class 1000, Class 10000, and Class 100000, strictly controlling the cleanliness of the production environment to ensure that the products ultimately meet semiconductor requirements. The company has also purchased advanced domestic and foreign equipment such as laser cutting, CNC precision machining, automatic equipment welding, pipeline micro welding, automatic polishing, and precision testing.
The company has introduced Japanese surface treatment technology to ensure that the electrochemical polishing and precision cleaning of the inner surface of the source bottle reach the advanced level of semiconductors, and has gained high recognition from domestic and foreign customers. We have developed, trial produced, and mass-produced various types of sampling and storage containers for our customers, which are widely used in fields such as semiconductors, liquid crystals, photovoltaics, and LEDs, fully meeting the high-quality requirements of the industry.
Detailed parameters:
Material Valve component: 316L EP; Bottle body: 316L (provided with titanium and Hastelloy) with internal EP treatment, Ra≤0.15μm Material can be loaded with chemical purity ≤99.9999999%（9N） airtightness test ≤1.0X10-10mbar.L/S(Also refer to valve leakage rate) medium Solid state/silicon adsorption precursor materials, silicon-based materials, and high-purity organic compounds Items that can be detected upon appearance Compression resistance, airtightness, moisture content, oxygen content, particulate matter, roughness, metal ion precipitation, etc Can provide manufacturing certification projects UN \ Pressure Vessels and ASME UM U Projects Volume and size More than 200 types of containers (25mL-26m ³) have been supplied Other options Interface form, number of valves, output and cleaning process, etc
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